CMOS Plasma and Process Damage

Prall, Kirk

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems. 

Details

Published by: Springer

Publication Date: 2025-05-17

Format: Hardcover

ISBN-13: 9783031890284

DOI: 10.1007/978-3-031-89029-1

Dimensions: 235cm x155cm

Pages: 466