Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies

Gentili, M.; Giovannella, Carlo; Selci, Stefano

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Details

Published by: Springer

Publication Date: 2010-12-05

Format: Paperback

ISBN-13: 9789048143887

DOI: 10.1007/978-94-015-8261-2

Dimensions: 235cm x155cm

Pages: 216